TFLN/TFLT (Thin-Film Lithium Niobate/Tantalate on Insulator) are high-quality single-crystal thin films fabricated via the H-Cut process. Leveraging its exceptional electro-optic properties (r₃₃ ≈ 30-80 pm/V), TFLN has become the material of choice for high-speed optical modulators (100GHz+) and quantum photonic devices. Its strong second-order nonlinearity (χ⁽²⁾) enables efficient wavelength conversion and entangled photon pair generation. TFLT, on the other hand, offers superior broadband transparency, making it ideal for mid-infrared sensing applications. With a higher optical damage threshold (>500 MW/cm²) and excellent thermal stability (dn/dT ≈ 1.5×10⁻⁵ K⁻¹), TFLT excels in high-power optical systems. Both materials are compatible with CMOS processes: TFLN focuses on high-speed communications and quantum optics, while TFLT shines in infrared optoelectronics and acousto-optic hybrid systems. Together, they drive advancements in next-generation integrated photonic devices.